Suwon-si, South Korea

Jin-Hee Bae

USPTO Granted Patents = 21 

Average Co-Inventor Count = 9.0

ph-index = 3

Forward Citations = 22(Granted Patents)


Location History:

  • Uiwang-si, KR (2011 - 2016)
  • Suwon-si, KR (2017 - 2022)

Company Filing History:


Years Active: 2011-2025

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21 patents (USPTO):

Title: Innovator Jin-Hee Bae: Pioneering Advances in Silica Layer Technologies

Introduction: Jin-Hee Bae is a prominent inventor based in Suwon-si, South Korea, known for his significant contributions to the field of materials science. With a remarkable portfolio encompassing 20 patents, Bae has developed innovative solutions that enhance the functionality and manufacturing processes of silica layers.

Latest Patents: Among his latest patents are pivotal inventions such as a composition for forming a silica layer, a manufacturing method for silica layers, and a unique silica layer itself. His patented composition for forming a silica layer includes a silicon-containing polymer and a solvent, adhering to the specified Relation 1 criteria. This composition demonstrates advanced characteristics beneficial for various applications. Another notable patent discloses a composition that utilizes perhydropolysilazane (PHPS). This invention emphasizes specific ratios in its NMR spectrum analysis, enhancing the effectiveness of the silica layers produced.

Career Highlights: Jin-Hee Bae has garnered valuable experience working at leading companies in the industry, including Samsung SDI Co., Inc. and Cheil Industries Inc. His work in these organizations has not only advanced his expertise in innovative materials but has also contributed to the broader technological landscape.

Collaborations: Throughout his career, Bae has collaborated with talented professionals such as Taek-Soo Kwak and Hui-Chan Yun. These partnerships have fostered a creative environment that has led to groundbreaking advancements in silica layer technologies and related fields.

Conclusion: Jin-Hee Bae's innovative spirit and dedication to research continue to influence the industry significantly. With a strong foundation of patents and collaborations, he is poised to remain at the forefront of technological advancements in silica layers, paving the way for future innovations.

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