The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Sep. 01, 2015
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventors:
Wan-Hee Lim, Suwon-si, KR;
Taek-Soo Kwak, Suwon-si, KR;
Han-Song Lee, Suwon-si, KR;
Eun-Su Park, Suwon-si, KR;
Sun-Hae Kang, Suwon-si, KR;
Bo-Sun Kim, Suwon-si, KR;
Sang-Kyun Kim, Suwon-si, KR;
Sae-Mi Park, Suwon-si, KR;
Jin-Hee Bae, Suwon-si, KR;
Jin-Woo Seo, Suwon-si, KR;
Jun-Young Jang, Suwon-si, KR;
Youn-Jin Cho, Suwon-si, KR;
Kwen-Woo Han, Suwon-si, KR;
Byeong-Gyu Hwang, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 103/14 (2006.01); C09D 183/14 (2006.01); C08K 5/01 (2006.01); C09D 183/16 (2006.01); C08G 77/54 (2006.01); C08G 77/62 (2006.01);
U.S. Cl.
CPC ...
C09D 183/14 (2013.01); C08K 5/01 (2013.01); C09D 183/16 (2013.01); C08G 77/54 (2013.01); C08G 77/62 (2013.01);
Abstract
A composition for forming a silica based layer includes a silicon-containing compound including polysilazane, polysiloxazane, or a combination thereof and one or more kinds of solvent, and having a turbidity increasing rate of less than or equal to about 0.13.