Sae-Mi Park

Title: The Innovative Contributions of Sae-Mi Park

Introduction

Sae-Mi Park is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of silica-based layers for electronic devices. With a total of four patents to his name, Park's work has garnered attention in the industry.

Latest Patents

Among his latest patents, Park has developed a composition for forming a silica-based layer. This composition includes a silicon-containing polymer with a polydispersity ranging from about 3.0 to about 30 and a solvent. The viscosity of this composition ranges from about 1.30 centipoise (cps) to about 1.80 cps at 25°C. Additionally, he has patented a method for manufacturing a silica-based layer, which includes a silicon-containing compound such as polysilazane or polysiloxazane, along with one or more solvents. This composition has a turbidity increasing rate of less than or equal to about 0.13.

Career Highlights

Sae-Mi Park is currently employed at Samsung SDI Co., Inc., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of electronic devices through improved materials.

Collaborations

Park has collaborated with notable colleagues, including Jin-Hee Bae and Taek-Soo Kwak, to further enhance the research and development efforts within his field.

Conclusion

Sae-Mi Park's contributions to the field of materials science and his innovative patents have positioned him as a key figure in the development of advanced electronic devices. His work continues to influence the industry and pave the way for future innovations.