Eun-Su Park

Title: Eun-Su Park: Innovator in Silica-Based Technologies

Introduction

Eun-Su Park is a prominent inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of silica-based layers. With a total of 9 patents to his name, Park's work has advanced the technology used in electronic devices.

Latest Patents

Eun-Su Park's latest patents include innovative compositions and methods for forming silica-based layers. One notable patent describes a composition that includes a silicon-containing compound, such as polysilazane or polysiloxazane, combined with one or more solvents. This composition is characterized by a turbidity increasing rate of less than or equal to about 0.13. Another patent focuses on a method for manufacturing a silica-based layer, which involves a silicon-containing compound that includes a hydrogenated polysilazane moiety or a hydrogenated polysiloxazane moiety. The composition ensures that the number of particles with a diameter of about 0.2 µm to about 1 µm is less than or equal to about 10/ml.

Career Highlights

Throughout his career, Eun-Su Park has worked with notable companies such as Cheil Industries Inc. and Samsung SDI Co., Inc. His experience in these organizations has allowed him to refine his expertise in materials science and contribute to cutting-edge innovations.

Collaborations

Eun-Su Park has collaborated with talented individuals in his field, including Taek-Soo Kwak and Han-Song Lee. These partnerships have fostered a creative environment that has led to significant advancements in silica-based technologies.

Conclusion

Eun-Su Park's contributions to the field of silica-based materials have positioned him as a key innovator in the industry. His patents and collaborations reflect a commitment to advancing technology in electronic devices.