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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9574108 B1

PDFFull Text
Date of Patent:
Feb. 21, 2017

Filed:

Apr. 23, 2014

Composition for forming silica based insulating layer, silica based insulating layer and method for manufacturing silica based insulating layer

Applicants:

Eun-su Park, Uiwang-si, KR;

Taek-soo Kwak, Uiwang-si, KR;

Yoong-hee NA, Uiwang-si, KR;

Hyun-ji Song, Uiwang-si, KR;

Han-song Lee, Uiwang-si, KR;

Seung-hee Hong, Uiwang-si, KR;

Inventors:

Eun-Su Park, Uiwang-si, KR;

Taek-Soo Kwak, Uiwang-si, KR;

Yoong-Hee Na, Uiwang-si, KR;

Hyun-Ji Song, Uiwang-si, KR;

Han-Song Lee, Uiwang-si, KR;

Seung-Hee Hong, Uiwang-si, KR;

Assignee:

CHEIL INDUSTRIES, INC., Gumi-si, Gyeongsangbuk-Do, KR;

Attorney:

Lee & Morse, P.C.

Primary Examiner:

Tae H Yoon

Int. Cl.
CPC ...
C08L 83/05 (2006.01); B05D 1/00 (2006.01); C09D 183/04 (2006.01); C08L 83/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C09D 183/04 (2013.01); C08L 83/02 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01); H01L 21/02282 (2013.01);
Abstract

A composition for forming a silica-based insulation layer, a silica-based insulation layer, and a method of manufacturing the silica-based insulation layer, the composition including a solvent; and an organosilane-based condensation polymerization product that includes a structural unit represented by the following Chemical Formula 1:

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