The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 01, 2014

Filed:

Jul. 13, 2012
Applicants:

Eun-su Park, Uiwang-si, KR;

Bong-hwan Kim, Uiwang-si, KR;

Sang-hak Lim, Uiwang-si, KR;

Taek-soo Kwak, Uiwang-si, KR;

Jin-hee Bae, Uiwang-si, KR;

Hui-chan Yun, Uiwang-si, KR;

Sang-kyun Kim, Uiwang-si, KR;

Jin-wook Lee, Uiwang-si, KR;

Inventors:

Eun-Su Park, Uiwang-si, KR;

Bong-Hwan Kim, Uiwang-si, KR;

Sang-Hak Lim, Uiwang-si, KR;

Taek-Soo Kwak, Uiwang-si, KR;

Jin-Hee Bae, Uiwang-si, KR;

Hui-Chan Yun, Uiwang-si, KR;

Sang-Kyun Kim, Uiwang-si, KR;

Jin-Wook Lee, Uiwang-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-si, Kyeongsangbuk-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

A filler for filling a gap includes a compound represented by the following Chemical Formula 1.SiNOH.  [Chemical Formula 1]In Chemical Formula 1, a, b, c, and d represent relative amounts of Si, N, 0, and H, respectively, in the compound, 1.96<a<2.68, 1.78<b<3.21, 0≦c<0.19, and 4<d<10.


Find Patent Forward Citations

Park, Eun-Su. (2014). Filler for filling a gap, method of preparing the same and method of manufacturing semiconductor capacitor using the same (U.S. Patent No. 8766411). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8766411

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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