The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Mar. 04, 2016
Applicant:

Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Junyoung Jang, Suwon-si, KR;

Huichan Yun, Suwon-si, KR;

Woo Han Kim, Suwon-si, KR;

Kunbae Noh, Suwon-si, KR;

Eunseon Lee, Suwon-si, KR;

Taeksoo Kwak, Suwon-si, KR;

Jingyo Kim, Suwon-si, KR;

Haneul Kim, Suwon-si, KR;

Yoong Hee Na, Suwon-si, KR;

Jin-Hee Bae, Suwon-si, KR;

Jinwoo Seo, Suwon-si, KR;

Byeonggyu Hwang, Suwon-si, KR;

Assignee:

Samsung SDI Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 183/08 (2006.01); C09D 1/00 (2006.01); C09D 7/00 (2018.01); C01B 33/12 (2006.01); H01L 21/02 (2006.01); C09D 7/20 (2018.01); C09D 183/16 (2006.01);
U.S. Cl.
CPC ...
C09D 1/00 (2013.01); C01B 33/12 (2013.01); C09D 7/001 (2013.01); C09D 7/20 (2018.01); H01L 21/02123 (2013.01); H01L 21/02282 (2013.01); C09D 183/08 (2013.01); C09D 183/16 (2013.01);
Abstract

A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN/m to about 35 mN/m at a temperature of about 25° C.


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