The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2018
Filed:
Dec. 11, 2015
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventors:
Eun-Seon Lee, Suwon-si, KR;
Woo-Han Kim, Suwon-si, KR;
Hui-Chan Yun, Suwon-si, KR;
Jin-Hee Bae, Suwon-si, KR;
Byeong-Gyu Hwang, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C09D 183/16 (2006.01); H01B 3/46 (2006.01); C08G 77/62 (2006.01);
U.S. Cl.
CPC ...
C09D 183/16 (2013.01); H01B 3/46 (2013.01); C08G 77/62 (2013.01);
Abstract
A composition for forming a silica layer includes a silicon-containing polymer and a solvent, wherein the silicon-containing polymer has a total sum of Si—H integral values in aH-NMR spectrum of less than or equal to about 12. The sum of the Si—H integral values is calculated under conditions described in the specification.