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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9845444 B1

PDFFull Text
Date of Patent:
Dec. 19, 2017

Filed:

Nov. 16, 2015

Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Ahn-Ho Lee, Yongin-si, KR;

Chung-Kyung Jung, Anyang-si, KR;

Dong-Min Kang, Seoul, KR;

Dong-Hun Kang, Suwon-si, KR;

Go-Un Kim, Suwon-si, KR;

Dong-Jin Kim, Suwon-si, KR;

Yong-Sik Yoo, Suwon-si, KR;

Young-Chul Jung, Suwon-si, KR;

Yu-Ri Jung, Suwon-si, KR;

Jung-Min Choi, Suwon-si, KR;

Sang-Kyun Kim, Suwon-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Gyeonggi-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Gregory Webb

Int. Cl.
CPC ...
C11D 7/50 (2006.01); C11D 1/00 (2006.01); C11D 3/20 (2006.01); C11D 3/30 (2006.01); C11D 11/00 (2006.01); C11D 1/66 (2006.01); C11D 1/72 (2006.01); C11D 3/28 (2006.01); C11D 3/43 (2006.01);
U.S. Cl.
CPC ...
C11D 1/008 (2013.01); C11D 1/662 (2013.01); C11D 1/667 (2013.01); C11D 1/72 (2013.01); C11D 3/2079 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01);
Abstract

A cleaning composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and an ultra pure water, wherein a pH value of the cleaning composition is equal to or higher than 12.

Find Patent Forward Citations

Lee, Ahn-Ho. (2017). Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the same (U.S. Patent No. 9845444). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9845444

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