Suwon, South Korea

Young-Chul Jung

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Young-Chul Jung. Retrieved from https://idiyas.com/inventor/young-chul-jung-hx5lnhsb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Young-Chul Jung: Innovator in Cleaning Compositions

Introduction

Young-Chul Jung is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of cleaning compositions, particularly in the context of chemical mechanical polishing. His innovative approach has led to the development of a unique cleaning composition that addresses specific challenges in the industry.

Latest Patents

Young-Chul Jung holds a patent for a cleaning composition after chemical mechanical polishing of organic film. This composition includes an organic solvent, an organic acid, a chelating agent, a surfactant containing at least one hydroxyl group (OH) at the end, and ultra-pure water. Notably, the pH value of this cleaning composition is equal to or higher than 12, making it effective for its intended purpose.

Career Highlights

Young-Chul Jung is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to focus on innovations that enhance product quality and efficiency in cleaning processes.

Collaborations

Young-Chul Jung has collaborated with notable colleagues, including Ahn-Ho Lee and Chung-Kyung Jung. These collaborations have contributed to the advancement of their shared goals in the field of cleaning technologies.

Conclusion

Young-Chul Jung's contributions to the field of cleaning compositions demonstrate his commitment to innovation and excellence. His patent reflects a significant advancement in the cleaning process after chemical mechanical polishing, showcasing his expertise and dedication to improving industry standards.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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