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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10345706 B1

PDFFull Text
Date of Patent:
Jul. 09, 2019

Filed:

Apr. 22, 2014

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

Applicants:

Hyun-ji Song, Uiwang-si, KR;

Yun-jun Kim, Uiwang-si, KR;

Go-un Kim, Uiwang-si, KR;

Young-min Kim, Uiwang-si, KR;

Hea-jung Kim, Uiwang-si, KR;

Joon-young Moon, Uiwang-si, KR;

Yo-choul Park, Uiwang-si, KR;

Yu-shin Park, Uiwang-si, KR;

You-jung Park, Uiwang-si, KR;

Seung-wook Shin, Uiwang-si, KR;

Yong-woon Yoon, Uiwang-si, KR;

Chung-heon Lee, Uiwang-si, KR;

Yoo-jeong Choi, Uiwang-si, KR;

Seung-hee Hong, Uiwang-si, KR;

Inventors:

Hyun-Ji Song, Uiwang-si, KR;

Yun-Jun Kim, Uiwang-si, KR;

Go-Un Kim, Uiwang-si, KR;

Young-Min Kim, Uiwang-si, KR;

Hea-Jung Kim, Uiwang-si, KR;

Joon-Young Moon, Uiwang-si, KR;

Yo-Choul Park, Uiwang-si, KR;

Yu-Shin Park, Uiwang-si, KR;

You-Jung Park, Uiwang-si, KR;

Seung-Wook Shin, Uiwang-si, KR;

Yong-Woon Yoon, Uiwang-si, KR;

Chung-Heon Lee, Uiwang-si, KR;

Yoo-Jeong Choi, Uiwang-si, KR;

Seung-Hee Hong, Uiwang-si, KR;

Assignee:

CHEIL INDUSTRIES, INC., Gumi-si, Gyeongsangbuk-do, KR;

Attorney:

Lee & Morse, P.C.

Primary Examiner:

Sin J Lee

Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/38 (2006.01); G03F 7/36 (2006.01); G03F 7/30 (2006.01); G03F 7/09 (2006.01); G03F 7/11 (2006.01); C07C 39/12 (2006.01); C07C 323/19 (2006.01); C07C 217/58 (2006.01); C07C 22/04 (2006.01); C07C 255/53 (2006.01); C07C 39/225 (2006.01); C07D 215/14 (2006.01); C07D 333/16 (2006.01); C07D 333/50 (2006.01); C07D 311/58 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); C07C 22/04 (2013.01); C07C 39/12 (2013.01); C07C 39/225 (2013.01); C07C 217/58 (2013.01); C07C 255/53 (2013.01); C07C 323/19 (2013.01); C07D 215/14 (2013.01); C07D 311/58 (2013.01); C07D 333/16 (2013.01); C07D 333/50 (2013.01); G03F 7/09 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/30 (2013.01); G03F 7/36 (2013.01); G03F 7/38 (2013.01); C07C 2601/14 (2017.05); C07C 2603/50 (2017.05); C07C 2603/52 (2017.05); C07C 2603/54 (2017.05);
Abstract

A monomer for a hardmask composition is represented by the following Chemical Formula 1,

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