The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2016
Filed:
Nov. 19, 2013
Applicants:
Sung-jae Lee, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Youn-jin Cho, Uiwang-si, KR;
Chul-ho Lee, Uiwang-si, KR;
Chung-heon Lee, Uiwang-si, KR;
Inventors:
Sung-Jae Lee, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Youn-Jin Cho, Uiwang-si, KR;
Chul-Ho Lee, Uiwang-si, KR;
Chung-Heon Lee, Uiwang-si, KR;
Assignee:
CHEIL INDUSTRIES, INC., Gumi-si, Kyeongsangbuk-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 43/23 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); C07C 33/26 (2006.01); G03F 7/075 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
C07C 33/26 (2013.01); C07C 43/23 (2013.01); G03F 7/0752 (2013.01); G03F 7/09 (2013.01); G03F 7/40 (2013.01);
Abstract
A monomer for a hardmask composition represented by the following Chemical Formula 1,
Lee, Sung-Jae. (2016). Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition (U.S. Patent No. 9284245). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9284245
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile