The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Apr. 13, 2015
Applicant:
Samsung Sdi Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventors:
Youn-Hee Nam, Suwon-si, KR;
Mi-Young Kim, Suwon-si, KR;
You-Jung Park, Suwon-si, KR;
Yun-Jun Kim, Suwon-si, KR;
Hea-Jung Kim, Suwon-si, KR;
Joon-Young Moon, Suwon-si, KR;
Hyun-Ji Song, Suwon-si, KR;
Chung-Heon Lee, Suwon-si, KR;
Yoo-Jeong Choi, Suwon-si, KR;
Assignee:
Samsung SDI Co., Ltd., Yongin-Si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/09 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/321 (2006.01); C08L 65/00 (2006.01); H01L 21/3213 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); C08L 65/00 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01);
Abstract
A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent.*-A-B—*  [Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.