The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 2014

Filed:

Sep. 23, 2011
Applicants:

Min-soo Kim, Uiwang-si, KR;

Hwan-sung Cheon, Uiwang-si, KR;

Jee-yun Song, Uiwang-si, KR;

Young-min Kim, Uiwang-si, KR;

Cheol-ho Lee, Uiwang-si, KR;

Chung-heon Lee, Uiwang-si, KR;

Inventors:

Min-Soo Kim, Uiwang-si, KR;

Hwan-Sung Cheon, Uiwang-si, KR;

Jee-Yun Song, Uiwang-si, KR;

Young-Min Kim, Uiwang-si, KR;

Cheol-Ho Lee, Uiwang-si, KR;

Chung-Heon Lee, Uiwang-si, KR;

Assignee:

Cheil Industries, Inc., Gumi-Si, Kyeongsangbuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2:


Find Patent Forward Citations

Loading…