Chun-Hsiang Fan

USPTO Granted Patents = 37 (Patent Applications = 4)

Average Co-Inventor Count = 4.2

ph-index = 5

Forward Citations = 202(Granted Patents)

Location History:

Longtan Township, Taoyuan County, TW (2015)
Longtan Township, TW (2015 - 2016)
Taoyuan, TW (2019)
Taoyuan County, TW (2016 - 2023)
Hsinchu, TW (2015 - 2024)

Company Filing History:

36 out of 40,635

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2015-2025

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37 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12439643 - Fin shape modification (2025-10-07),

2. 12432954 - Semiconductor device structure with fin and method for forming the same (2025-09-30),

3. 12310093 - Semiconductor device and manufacturing method thereof (2025-05-20),

4. 12191380 - Semiconductor device and method (2025-01-07),

5. 12176422 - Controlling fin-thinning through feedback (2024-12-24),

6. 11923437 - Controlling fin-thinning through feedback (2024-03-05),

7. 11823945 - Method for cleaning semiconductor wafer (2023-11-21),

8. 11772134 - Sonic cleaning of brush (2023-10-03),

9. 11670717 - Structure of S/D contact and method of making same (2023-06-06),

10. 11424347 - Semiconductor device and method (2022-08-23),

11. 11158726 - Controlling fin-thinning through feedback (2021-10-26),

12. 11133200 - Substrate vapor drying apparatus and method (2021-09-28),

13. 10930784 - FETs and methods for forming the same (2021-02-23),

14. 10868149 - Source and drain surface treatment for multi-gate field effect transistors (2020-12-15),

15. 10693009 - Structure of S/D contact and method of making same (2020-06-23),

Title: The Innovative Contributions of Chun-Hsiang Fan

Introduction: Chun-Hsiang Fan, based in Hsin-Chu, Taiwan, is a prominent inventor with a remarkable portfolio of 34 patents. His work primarily focuses on advancements in semiconductor technology, reflecting his significant contributions to the field.

Latest Patents: Among his latest innovations, Chun-Hsiang Fan has developed methods aimed at enhancing the profiles of channel regions in semiconductor devices. One such method involves forming a semiconductor fin over a substrate, where the germanium concentration varies across different portions of the fin. This technique allows for precise trimming of the fin, promoting higher efficiency in semiconductor devices. Additionally, he has introduced a method for controlling fin-thinning through feedback, where isolation regions are created in a substrate, allowing for the formation and precise measurement of semiconductor fins.

Career Highlights: Chun-Hsiang Fan has accumulated significant experience in the semiconductor industry, having worked with prominent organizations such as Taiwan Semiconductor Manufacturing Company Limited and National Tsing Hua University. His expertise in semiconductor devices has positioned him as a key figure in driving innovations within the sector.

Collaborations: Throughout his career, Chun-Hsiang Fan has collaborated with notable colleagues, including Yu-Lien Huang and Tung Ying Lee. These partnerships have further enhanced the quality and impact of his inventions, contributing to the advancement of technology in semiconductor research.

Conclusion: Chun-Hsiang Fan exemplifies the spirit of innovation in the semiconductor industry. With his extensive patent portfolio and collaborative efforts, he continues to make substantial contributions that enhance the capabilities of semiconductor devices, paving the way for future advancements in technology.

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4 patents pending:

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