The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Feb. 02, 2018
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Han-Yeou Huang, Zhudong Township, TW;
Chun-Hsiang Fan, Hsinchu, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD, Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/12 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 3/02 (2006.01); B08B 1/04 (2006.01); B08B 1/00 (2006.01); H01L 21/67 (2006.01); B08B 3/10 (2006.01); A46B 17/06 (2006.01);
U.S. Cl.
CPC ...
B08B 3/12 (2013.01); A46B 17/06 (2013.01); B08B 1/007 (2013.01); B08B 1/04 (2013.01); B08B 3/022 (2013.01); B08B 3/044 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); B08B 1/002 (2013.01);
Abstract
A method includes cleaning a wafer with a brush element where the brush element collects particles from the wafer during the cleaning process. The brush element is immersed in a first cleaning liquid. An ultrasonic or megasonic vibration is applied to the first cleaning liquid. The ultrasonic or megasonic vibration causes the particles to dislodge from the brush element into the first cleaning liquid. The particles contaminate the first cleaning liquid.