logo

For the Inventor, By the Inventor

Taipei, Taiwan

Chia-Ying Lee

This inventor holds 57 USPTO granted patents and 1 published patent application, primarily in Integrated Circuit Fabrication (CPC class H01L). Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chia-Ying Lee. Retrieved from https://idiyas.com/inventor/chia-ying-lee-ypxn0jln

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 57 

% Patents Active = 82.5

Average Co-Inventor Count = 3.2

ph-index = 8

Forward Citations = 410(Granted Patents)

Forward Citations (Not Self Cited) = 362(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Taichung, TW (2017)
  • New Taipei, TW (2014 - 2024)

Company Filing History:

goldMedal57 out of 43,553 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 2014-2026

Loading Chart...
Areas of Expertise:
Fin Field-Effect Transistor
Double Patterning
Self-Aligned Interconnect
Spacer Etching
Nano Wire Structure
Litho-Etch Patterning
High Performance Contacts
Integrated Circuit Design
Fine Line Space Resolution
Nanowire Formation
57 patents (USPTO):Explore Patents
1. 12642067 - Self-aligned interconnect with protection layer (2026-05-26),
2. 12389667 - Fin field-effect transistor device and method (2025-08-12),
3. 12381081 - Method of breaking through etch stop layer (2025-08-05),
4. 12040233 - Fin field-effect transistor device and method (2024-07-16),
5. 12009258 - Self-aligned interconnect with protection layer (2024-06-11),
6. 11923202 - Double patterning method (2024-03-05),
7. 11901180 - Method of breaking through etch stop layer (2024-02-13),
8. 11854820 - Spacer etching process for integrated circuit design (2023-12-26),
9. 11521857 - Cut first self-aligned litho-etch patterning (2022-12-06),
10. 11482426 - Double patterning method (2022-10-25),
11. 11276571 - Method of breaking through etch stop layer (2022-03-15),
12. 11177138 - Double patterning method (2021-11-16),
13. 11037789 - Cut last self-aligned litho-etch patterning (2021-06-15),
14. 10998228 - Self-aligned interconnect with protection layer (2021-05-04),
15. 10879129 - Self-aligned nanowire formation using double patterning (2020-12-29),

Title: Innovations and Contributions of Chia-Ying Lee in Semiconductor Technology

Introduction

Chia-Ying Lee is a prominent inventor based in New Taipei, Taiwan, recognized for his significant contributions to the field of semiconductor technology. With an impressive portfolio of 54 patents, he has played a vital role in advancing innovative solutions within the industry.

Latest Patents

Lee’s latest patents showcase his expertise in developing cutting-edge semiconductor devices. One noteworthy patent is the "Fin Field-Effect Transistor Device and Method," which details a sophisticated method for forming a semiconductor device. This method involves the formation of a metal gate structure over a fin that extends above a substrate, followed by a series of precise etching processes to ensure optimal performance and reliability. Another key patent is the "Self-Aligned Interconnect with Protection Layer," which outlines an integrated circuit structure that includes layered inter-dielectric components, gate stacks, and protective layers. This invention highlights his commitment to enhancing the durability and efficiency of semiconductor devices.

Career Highlights

Chia-Ying Lee is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leader in semiconductor manufacturing. His extensive experience and innovative mindset have positioned him as a vital asset in the development of advanced technologies within the company.

Collaborations

Throughout his career, Lee has collaborated with esteemed colleagues such as Jyu-Horng Shieh and Ching-Feng Fu. These partnerships have facilitated the exchange of ideas and expertise, leading to groundbreaking advancements in semiconductor technologies.

Conclusion

Chia-Ying Lee's contributions to the semiconductor industry, evidenced by his numerous patents and collaborative efforts, underscore his role as a leading inventor. His innovative work continues to shape the future of technology, ensuring that he remains a pivotal figure in the realm of semiconductor development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…