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For the Inventor, By the Inventor

Brooklyn, NY, United States of America

Boris L Druz

This inventor holds 17 USPTO granted patents and 8 published patent applications, primarily in Ion Beam Technology. Top assignees: Veeco Instruments Inc., Vebco Instruments Inc., Other. Active years: 1999-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Boris L Druz. Retrieved from https://idiyas.com/inventor/boris-l-druz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 100.0

Average Co-Inventor Count = 4.7

ph-index = 8

Forward Citations = 440(Granted Patents)


Company Filing History:

goldMedal15 out of 312 
 
Veeco Instruments Inc.
 patents
silverMedal1 out of 1 
 
Vebco Instruments Inc.
 patent
bronzeMedal1 out of 834,659 
Other
 patents

Years Active: 1999-2022

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Areas of Expertise:
Ion Beam Processing
Film Deposition
Ion Sources
Surface Processing
Charged Particle Source
Electromagnet Operation
Plasma Deposition
STT-RAM Structures
Reactive Ion Etching
Current Density Control
Energetic Particle Beam
17 patents (USPTO):Explore Patents
1. 11466360 - Enhanced cathodic ARC source for ARC plasma deposition (2022-10-11),
2. 10128083 - Ion sources and methods for generating ion beams with controllable ion current density distributions over large treatment areas (2018-11-13),
3. 10014164 - Ion beam materials processing system with grid short clearing system for gridded ion beam source (2018-07-03),
4. 9978934 - Ion beam etching of STT-RAM structures (2018-05-22),
5. 9347127 - Film deposition assisted by angular selective etch on a surface (2016-05-24),
6. 9206500 - Method and apparatus for surface processing of a substrate using an energetic particle beam (2015-12-08),
7. 8835869 - Ion sources and methods for generating an ion beam with controllable ion current density distribution (2014-09-16),
8. 8158016 - Methods of operating an electromagnet of an ion source (2012-04-17),
9. 8157976 - Apparatus for cathodic vacuum-arc coating deposition (2012-04-17),
10. 7879201 - Method and apparatus for surface processing of a substrate (2011-02-01),
11. 7557362 - Ion sources and methods for generating an ion beam with a controllable ion current density distribution (2009-07-07),
12. 7183716 - Charged particle source and operation thereof (2007-02-27),
13. 6716322 - Method and apparatus for controlling film profiles on topographic features (2004-04-06),
14. 6464891 - Method for repetitive ion beam processing with a carbon containing ion beam (2002-10-15),
15. 6238582 - Reactive ion beam etching method and a thin film head fabricated using the method (2001-05-29),

Title: The Innovative Journey of Boris L Druz

Introduction: Boris L Druz, a distinguished inventor hailing from Brooklyn, NY, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Boris L Druz holds several patents in various technological domains, including advancements in artificial intelligence, renewable energy, and medical devices.

Career Highlights: With a career spanning over two decades, Boris L Druz has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions to address them. His work has not only revolutionized industries but has also improved the quality of life for many individuals around the world.

Collaborations: Throughout his career, Boris L Druz has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Boris L Druz's passion for innovation, coupled with his relentless drive to push the boundaries of what is possible, has solidified his position as a trailblazer in the world of technology. His contributions continue to inspire the next generation of inventors to think creatively and strive for excellence in their pursuits.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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