The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Feb. 26, 2008
Alan V. Hayes, Great Neck, NY (US);
Rustam Yevtukhov, Briarwood, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Alan V. Hayes, Great Neck, NY (US);
Rustam Yevtukhov, Briarwood, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Veeco Instruments, Inc., Woodbury, NY (US);
Abstract
Methods of operating an electromagnet of an ion source for generating an ion beam with a controllable ion current density distribution. The methods may include generating plasma in a discharge space of the ion source, generating and shaping a magnetic field in the discharge space by applying a current to an electromagnet that is effective to define a plasma density distribution, extracting an ion beam from the plasma, measuring a distribution profile for the ion beam density, and comparing the actual distribution profile with a desired distribution profile for the ion beam density. Based upon the comparison, the current applied to the electromagnet may be adjusted either manually or automatically to modify the magnetic field in the discharge space and, thereby, alter the plasma density distribution.