Company Filing History:
11 out of 304 
1 out of 832,680 Years Active: 2003-2022
Title: Viktor Kanarov: Innovator in Plasma Deposition Technology
Introduction
Viktor Kanarov is a distinguished inventor based in Bellmore, NY, with a remarkable portfolio of 12 patents. His work primarily focuses on advancements in plasma deposition technology, which has significant implications in various industrial applications.
Latest Patents
One of Kanarov's latest patents is the "Enhanced Cathodic ARC Source for ARC Plasma Deposition." This invention presents an improved cathodic arc source and method for depositing diamond-like carbon (DLC) films. The process utilizes a carbon-containing directional-jet plasma flow generated within a cylindrical graphite cavity. The design allows for a strong self-constriction of the plasma flow, enhancing the quality of the deposited film. The method involves a repetitive process that alternates between plasma generation and a recovery step, ensuring the removal of excess carbon from the cavity walls. This innovative approach results in films with improved hardness, density, transparency, and high reproducibility.
Another significant patent is the "Method and Apparatus for Surface Processing of a Substrate Using an Energetic Particle Beam." This invention outlines a method for processing substrates with an energetic particle beam, where features on the substrate are oriented relative to the beam. The substrate is periodically indexed to reorient its features, optimizing the processing efficiency.
Career Highlights
Kanarov has made substantial contributions to the field of plasma technology through his work at Veeco Instruments Inc. His expertise in developing advanced deposition techniques has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Kanarov has collaborated with notable professionals, including Alan V. Hayes and Rustam Yevtukhov. These collaborations have further enriched his research and development efforts.
Conclusion
Viktor Kanarov's innovative contributions to plasma deposition technology exemplify his commitment to advancing industrial applications. His patents reflect a deep understanding of the complexities involved in material processing, making him a significant figure in the field.
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