The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Aug. 11, 2004
Boris Druz, Brooklyn, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Hariharakeshave S. Hegde, Little Neck, NY (US);
Alan V. Hayes, Centerport, NY (US);
Emmanuel Lakios, Mount Sinai, NY (US);
Boris Druz, Brooklyn, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Hariharakeshave S. Hegde, Little Neck, NY (US);
Alan V. Hayes, Centerport, NY (US);
Emmanuel Lakios, Mount Sinai, NY (US);
Veeco Instruments Inc., Woodbury, NY (US);
Abstract
Method and apparatus for processing a substrate with a beam of energetic particles. The beam is directed from a source through a rectangular aperture in a shield positioned between the source and substrate to a treatment zone in a plane of substrate movement. Features on the substrate are aligned parallel to a major dimension of the rectangular aperture and the substrate is moved orthogonally to the aperture's major dimension. The beam impinges the substrate through the aperture during movement. The substrate may be periodically rotated by approximately 180° to reorient the features relative to the major dimension of the rectangular aperture. The resulting treatment profile is symmetrical about the sides of the features oriented toward the major dimension of the rectangular aperture.