The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Feb. 04, 2004
Viktor Kanarov, Bellmore, NY (US);
Alan V. Hayes, Centerport, NY (US);
Rustam Yevtukhov, Briarwood, NY (US);
Ira Reiss, New City, NY (US);
Roger P. Fremgen, Jr., Northport, NY (US);
Adrian Celaru, Massapequa, NY (US);
Kurt E. Williams, Seaford, NY (US);
Carlos Fernando DE Mello Borges, Central Islip, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Renga Rajan, Dix Hills, NY (US);
Hari Hegde, Little Neck, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Alan V. Hayes, Centerport, NY (US);
Rustam Yevtukhov, Briarwood, NY (US);
Ira Reiss, New City, NY (US);
Roger P. Fremgen, Jr., Northport, NY (US);
Adrian Celaru, Massapequa, NY (US);
Kurt E. Williams, Seaford, NY (US);
Carlos Fernando de Mello Borges, Central Islip, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Renga Rajan, Dix Hills, NY (US);
Hari Hegde, Little Neck, NY (US);
Veeco Instruments, Inc., Woodbury, NY (US);
Abstract
A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.