Renga Rajan

Title: Innovations of Renga Rajan in Charged Particle Technology

Introduction

Renga Rajan is an accomplished inventor based in Dix Hills, NY (US). He has made significant contributions to the field of charged particle technology, particularly through his innovative patent. His work focuses on enhancing the uniformity and efficiency of charged particle sources, which are crucial in various applications.

Latest Patents

Renga Rajan holds a patent for a "Charged particle source and operation thereof." This invention utilizes a novel plasma processing chamber, RF coil, and ion optics to achieve high uniformity. The plasma processing chamber features a re-entrant vessel that is movable and includes extensions of adjustable shape or position. This design aims to create a more uniform plasma within the chamber. Additionally, the invention incorporates one or more magnets, which can be either static or moving, within the re-entrant vessel. The ion optics consist of a grid with multiple apertures and tuning features surrounding each aperture. These tuning features either reduce the diameter of the associated aperture or increase its length, resulting in more uniform beamlets emerging from the grid. The RF coil is designed with a flux concentrator positioned adjacent to the winding in at least one angular region to optimize the magnetic field produced.

Career Highlights

Renga Rajan is currently employed at Veeco Instruments Inc., where he continues to develop innovative technologies in the field of charged particles. His expertise and dedication to research have positioned him as a valuable asset in his company.

Collaborations

Renga has collaborated with notable colleagues, including Viktor Kanarov and Alan V Hayes. Their combined efforts contribute to advancing the technology and applications of charged particle sources.

Conclusion

Renga Rajan's innovative work in charged particle technology exemplifies the importance of advancements in this field. His patent reflects a commitment to improving the efficiency and uniformity of charged particle sources, which can have far-reaching implications in various industries.