Veeco Instruments Inc.

Renga Rajan

Alan V Hayes

Boris L Druz

Viktor Kanarov

Rustam Yevtukhov

Ira Reiss

Hari S Hegde

Kurt E Williams

Roger P Fremgen

Adrian Celaru

Carlos Fernando De Mello Borges

A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

Charged particle source and operation thereof

Growing community of inventors

Dix Hills, NY, United States of America

Renga Rajan