Location History:
- Flushing, NY (US) (2000 - 2003)
- Little Neck, NY (US) (2007)
Company Filing History:
Years Active: 2000-2007
Title: Innovations of Hari S Hegde
Introduction
Hari S Hegde is an accomplished inventor based in Flushing, NY (US). He holds a total of 4 patents that showcase his expertise in advanced technologies. His work primarily focuses on charged particle sources and electromagnetic field generators, contributing significantly to the field of ion beam deposition.
Latest Patents
One of his latest patents is titled "Charged particle source and operation thereof." This invention utilizes a novel plasma processing chamber, RF coil, and ion optics to achieve high uniformity. The plasma processing chamber features a re-entrant vessel that is movable and includes extensions of adjustable shape or position, enhancing the uniformity of the plasma contained within. Additionally, the ion optics consist of a grid with multiple apertures and tuning features that optimize the beamlets emerging from the grid. Another significant patent is the "Electromagnetic field generator and method of operation." This invention provides precise control of magnetic field directionality for ion beam deposition of magnetic thin-film materials. The design reduces weight and maintenance requirements while ensuring effective deposition of oriented magnetic films.
Career Highlights
Hari S Hegde is currently employed at Veeco Instruments Inc., where he continues to innovate and develop cutting-edge technologies. His contributions have been instrumental in advancing the capabilities of ion beam deposition systems.
Collaborations
Throughout his career, Hegde has collaborated with notable colleagues, including Alan V Hayes and Roger P Fremgen. These partnerships have fostered a collaborative environment that enhances innovation and research.
Conclusion
Hari S Hegde's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in ion beam deposition and related technologies.