Veeco Instruments Inc.

Hari S Hegde

Alan V Hayes

Adrian J Devasahayam

Jinsong Wang

Roger P Fremgen

Boris L Druz

Viktor Kanarov

Rustam Yevtukhov

Ira Reiss

Kurt E Williams

Abraham J Navy

Adrian Celaru

Mihai S Risca

Carlos Fernando De Mello Borges

Renga Rajan

A charged particle source utilizes a novel plasma processing chamber, RF coil and ion optics, to achieve high uniformity. The plasma processing chamber has a re-entrant vessel which is movable, and which includes extensions of adjustable shape or position, to make more uniform the plasma contained within the chamber. One or more magnets, which may be static or moving, may be included within the re-entrant vessel. The ion optics include a grid with a number of apertures, and tuning features each surrounding an aperture. These tuning features either reduce the diameter of the associated aperture, or increase the length of that aperture, to create more uniform beamlets emerging from the grid. The RF coil includes a flux concentrator positioned adjacent to the winding in at least one angular region thereof to tune the magnetic field produced thereby.

Charged particle source and operation thereof

An electromagnetic field generator and method of operation for ion beam deposition of magnetic thin-film materials is presented. A combination of open frame electromagnetic field generator elements provides precise control of magnetic field directionality. This control enables deposition of oriented magnetic films with minimal directionality error. The magnetic field direction may be oriented to enable the deposition of alternating layers of directionally oriented magnetic films. An open frame element reduces the weight of the electromagnetic field generator while truncated corners reduce diagonal clearance that may be required in a vacuum chamber. An open frame design also enables the electromagnetic field generator to surround and thus remain clear of the active deposition area; the electromagnetic field generator can thus be shielded from accumulation of sputtered material. Shielding from accumulation of sputter material reduces maintenance requirements.

Electromagnetic field generator and method of operation

This invention is directed to methods for depositing multilayered thin films onto substrates, for example in making thin film magnetic heads. In accordance with the invention a first film, such as Cr, is deposited onto the substrate at a first pressure and a second layer, such as CoCrPt is deposited at a second pressure.

Method of depositing multilayer thin films

This invention is directed to methods for depositing multilayered thin films onto substrates, for example in making thin film magnetic heads. In accordance with the invention a first film, such as Cr, is deposited onto the substrate at a first angle and a second layer, such as CoCrPt is deposited at a second angle.

Methods of depositing multilayer thin films

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Flushing, NY, United States of America

Hari S Hegde