The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2004
Filed:
Apr. 19, 2002
Applicant:
Inventors:
Hari Hedge, Little Neck, NY (US);
Alan V. Hayes, Centerport, NY (US);
Boris Druz, Brooklyn, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Adrian J. Devasahayam, Woodmere, NY (US);
Emmanuel Lakios, Mt. Sinai, NY (US);
Assignee:
Veeco Instruments Inc., Woodbury, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; B05C 1/111 ; H05H 1/24 ;
U.S. Cl.
CPC ...
C23C 1/434 ; B05C 1/111 ; H05H 1/24 ;
Abstract
A deposition system includes a substrate holder supporting a substrate defining at least one topographical feature. In addition, the system includes a deposition plume that is directed toward the substrate. A first profiler mask is positioned between the deposition plume and the substrate, and is shaped so as to reduce inboard/outboard asymmetry in a deposition profile associated with the feature.