Little Neck, NY, United States of America

Hari Hedge


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Discovering the Innovations of Inventor Hari Hedge

Introduction

Hari Hedge, a distinguished inventor based in Little Neck, NY, is known for his innovative contributions to the field of deposition systems. With a patent to his name, he has made significant strides in addressing the complexities associated with film profiles on topographical features.

Latest Patents

Hari Hedge holds a patent for a "Method and apparatus for controlling film profiles on topographic features." This patent describes a deposition system that includes a substrate holder supporting a substrate with at least one topographical feature. The system also features a deposition plume directed toward the substrate, with a first profiler mask strategically positioned between the deposition plume and the substrate. This mask is designed to reduce inboard/outboard asymmetry in the deposition profile associated with the feature, showcasing Hedge's innovative approach to enhancing deposition techniques.

Career Highlights

Currently employed at Veeco Instruments Inc., Hari Hedge has been pivotal in developing advanced technologies that improve the precision and efficiency of deposition processes. His work has contributed to enhancing the capabilities of various industries reliant on high-quality thin films.

Collaborations

Throughout his career, Hari Hedge has collaborated with notable coworkers including Alan V. Hayes and Boris L. Druz. These partnerships have allowed for the exchange of ideas and expertise, further propelling innovation within the company.

Conclusion

In summary, Hari Hedge stands out as a prominent inventor whose work in controlling film profiles has significant implications for the deposition industry. His patent and collaborative efforts at Veeco Instruments Inc. emphasize his commitment to innovation and excellence in engineering.

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