The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Feb. 26, 2007
Applicants:
Rustam Yevtukhov, Briarwood, NY (US);
Alan V. Hayes, Great Neck, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Inventors:
Rustam Yevtukhov, Briarwood, NY (US);
Alan V. Hayes, Great Neck, NY (US);
Viktor Kanarov, Bellmore, NY (US);
Boris L. Druz, Brooklyn, NY (US);
Assignee:
Veeco Instruments Inc., Woodbury, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/10 (2006.01); H01J 1/50 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.