Shizuoka, Japan

Atsushi Nakamura

This inventor holds 19 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Semiconductor Manufacturing. Top assignees: Fujifilm Corporation, Nisshinbo Industries, Inc., Koito Manufacturing Company, Ltd.. Active years: 2003-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Atsushi Nakamura. Retrieved from https://idiyas.com/inventor/atsushi-nakamura-ac4pajsd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 57.9

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Haibara-gun, JP (2017 - 2019)
  • Zwijndrecht, BE (2018 - 2020)
  • Shizuoka, JP (2003 - 2024)

Company Filing History:


Years Active: 2003-2025

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Areas of Expertise:
Scintillator Material
Semiconductor Device
Resin Composition
Pattern Forming
Laminate
Temporary Adhesion
Cured Substance
Electronic Device
Ink Jet Recording Sheet
Multi-Layered Resist
Wafer Treatment
Manufacturing Method
19 patents (USPTO):Explore Patents

Title: Innovations by Atsushi Nakamura

Introduction

Atsushi Nakamura is a prominent inventor based in Shizuoka, Japan, known for his significant contributions to the field of materials science. With a total of 19 patents, his work primarily focuses on manufacturing methods for advanced materials including scintillator materials and cured substances.

Latest Patents

Nakamura's recent innovations include a **manufacturing method of scintillator material** and associated scintillator materials. This method involves using a quartz glass substrate with a recess, filled with a mixture of iodide raw material and SiOfine particles, subsequently covered with a lid and heated to form a nanocomposite layer that integrates an iodide phosphor into a cristobalite structure. In addition, he has developed a **manufacturing method for a cured substance** that enhances breaking elongation, incorporating various steps such as applying a resin composition to a base material, treating it with a specialized liquid, and heating it to achieve desired properties. His other noteworthy patents concern manufacturing methods for laminates and semiconductor devices.

Career Highlights

Throughout his career, Atsushi Nakamura has been associated with notable companies such as Fujifilm Corporation and Nisshinbo Industries, Inc. His work at these organizations has contributed to advancements in manufacturing technologies and materials.

Collaborations

Nakamura has worked alongside talented individuals such as Yu Iwai and Keita Kato, who have shared expertise and driven collaborative innovations in their projects.

Conclusion

Atsushi Nakamura continues to push the boundaries of material science with his innovative patent work. His commitment to enhancing manufacturing processes contributes significantly to the technology sector and underscores the importance of research and development in creating cutting-edge materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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