The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2016
Filed:
Dec. 27, 2013
Fujifilm Corporation, Tokyo, JP;
Keita Kato, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Tadahiro Odani, Shizuoka, JP;
Atsushi Nakamura, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.