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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9417528 B1

PDFFull Text
Date of Patent:
Aug. 16, 2016

Filed:

May. 15, 2015

Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device

Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Michihiro Shirakawa, Shizuoka, JP;

Keita Kato, Shizuoka, JP;

Tadahiro Odani, Shizuoka, JP;

Atsushi Nakamura, Shizuoka, JP;

Hidenori Takahashi, Shizuoka, JP;

Kaoru Iwato, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Brittany Raymond

Int. Cl.
CPC ...
G03F 7/30 (2006.01); G03F 7/095 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); G03F 7/039 (2006.01); G03F 7/09 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/095 (2013.01); G03F 7/038 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/0757 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/325 (2013.01); H01L 21/0271 (2013.01);
Abstract

A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

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