The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2015
Filed:
Apr. 21, 2014
Fujifilm Corporation, Tokyo, JP;
Keita Kato, Shizuoka, JP;
Michihiro Shirakawa, Shizuoka, JP;
Tadahiro Odani, Shizuoka, JP;
Atsushi Nakamura, Shizuoka, JP;
Hidenori Takahashi, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.