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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Atif Noori

LinkedIn
USPTO Granted Patents = 22 

 

Average Co-Inventor Count = 5.5

ph-index = 4

Forward Citations = 58(Granted Patents)


Company Filing History:

goldMedal21 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal2 out of 15,458 
 
University of California
 patents
bronzeMedal1 out of 2 
 
Appled Materials, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2010-2024

where 'Filed Patents' based on already Granted Patents

22 patents (USPTO):
1. 11887855 - Methods for depositing fluorine/carbon-free conformal tungsten (2024-01-30),
2. 10985023 - Methods for depositing fluorine/carbon-free conformal tungsten (2021-04-20),
3. 9683287 - Deposition of films comprising aluminum alloys with high aluminum content (2017-06-20),
4. 9607920 - Self-limiting chemical vapor deposition and atomic layer deposition methods (2017-03-28),
5. 9601339 - Methods for depositing fluorine/carbon-free conformal tungsten (2017-03-21),
6. 9443728 - Accelerated relaxation of strain-relaxed epitaxial buffers by use of integrated or stand-alone thermal processing (2016-09-13),
7. 9441298 - Devices including metal-silicon contacts using indium arsenide films and apparatus and methods (2016-09-13),
8. 9305780 - Self-limiting chemical vapor deposition and atomic layer deposition methods (2016-04-05),
9. 9269584 - N-metal film deposition with initiation layer (2016-02-23),
10. 9269574 - Methods of fabricating dielectric films from metal amidinate precursors (2016-02-23),
11. 9230815 - Methods for depositing fluorine/carbon-free conformal tungsten (2016-01-05),
12. 9190320 - Devices including metal-silicon contacts using indium arsenide films and apparatus and methods (2015-11-17),
13. 9145612 - Deposition of N-metal films comprising aluminum alloys (2015-09-29),
14. 9082702 - Atomic layer deposition methods for metal gate electrodes (2015-07-14),
15. 8987080 - Methods for manufacturing metal gates (2015-03-24),

Title: Innovations and Contributions of Atif Noori

Introduction

Atif Noori, based in Saratoga, California, is a prominent inventor known for his significant contributions to the field of materials science, particularly in atomic layer deposition. With an impressive portfolio of 22 patents, he has made notable advancements that have impacted both industry and research.

Latest Patents

Among his latest patents are innovative methods for depositing fluorine/carbon-free conformal tungsten. These methods utilize atomic layer deposition techniques to create tungsten films or tungsten-containing films using tungsten pentachloride, showcasing his commitment to advancing sustainable and efficient manufacturing processes.

Career Highlights

Throughout his career, Atif has worked with influential organizations, including Applied Materials, Inc. and the University of California. His expertise has propelled developments in semiconductor technologies and advanced manufacturing processes, solidifying his reputation as a leading inventor in his field.

Collaborations

Atif has collaborated with esteemed colleagues, including Mei Yin Chang and Srinivas Gandikota, further enhancing the collaborative spirit of innovation within the industry. These partnerships reflect his dedication to advancing technology and fostering a culture of ingenuity.

Conclusion

Atif Noori's innovative work and extensive patent portfolio illustrate his significant contributions to technology and materials science. His efforts in developing sustainable manufacturing processes for tungsten deposition exemplify the impact that devoted inventors can have on both industry and academia. As he continues to push the boundaries of innovation, the future holds great promise for further advancements in his field.

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