The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2016
Filed:
Oct. 24, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xinyu Fu, Pleasanton, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Avgerinos V. Gelatos, Redwood City, CA (US);
Atif Noori, Saratoga, CA (US);
Mei Chang, Saratoga, CA (US);
David Thompson, San Jose, CA (US);
Steve G. Ghanayem, Los Altos, CA (US);
Assignee:
Appled Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01L 21/28 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01); H01L 21/768 (2006.01); C23C 16/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28506 (2013.01); C23C 16/14 (2013.01); C23C 16/4557 (2013.01); C23C 16/45551 (2013.01); C23C 16/45563 (2013.01); C23C 16/45574 (2013.01); H01L 21/28088 (2013.01); H01L 21/28562 (2013.01); H01L 21/76877 (2013.01);
Abstract
Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WClor WCl.