Pleasanton, CA, United States of America

Xinyu Fu

This inventor holds 46 USPTO granted patents and 2 published patent applications and 2 EPO patents, primarily in Metal Deposition. Top assignees: Applied Materials, Inc., Appled Materials, Inc.. Active years: 2009-2024.

USPTO Granted Patents = 46 

% Patents Active = 63.0

 

Average Co-Inventor Count = 3.7

ph-index = 9

Forward Citations = 709(Granted Patents)


Location History:

  • Fremont, CA (US) (2009 - 2015)
  • Pleasanton, CA (US) (2013 - 2024)

Company Filing History:


Years Active: 2009-2024

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Areas of Expertise:
Metal Deposition
Cobalt Gap-Fill
Atomic Layer Deposition
Low-Resistance Contacts
Fluorine-Free Tungsten
Semiconductor Devices
N-Type Metal Oxide
Plasma Treatment
CVD Cobalt Films
Sputter Reactor
Copper Alloy Layers
Electromigration Lifetime
46 patents (USPTO):Explore Patents

Title: The Innovative Journey of Inventor Xinyu Fu

Introduction:

Xinyu Fu, a talented inventor based in Pleasanton, CA, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents:

Fu's latest patents include cutting-edge advancements in artificial intelligence algorithms for autonomous vehicles and smart home systems, showcasing his commitment to pushing the boundaries of technological progress.

Career Highlights:

With a background in computer science and engineering, Xinyu Fu has a distinguished career marked by a series of successful inventions that have revolutionized various industries. His work has been recognized for its creativity and practical applications.

Collaborations:

Fu has collaborated with leading tech companies and research institutions to further develop his inventions and bring them to market. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion:

Inventor Xinyu Fu's relentless pursuit of innovation and his passion for creating solutions to complex technological challenges have solidified his reputation as a visionary in the field. His contributions continue to inspire the next generation of inventors and shape the future of technology.

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