The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Aug. 11, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xinyu Fu, Pleasanton, CA (US);
David Knapp, Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Jeffrey W. Anthis, San Jose, CA (US);
Mei Chang, Saratoga, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01); H01L 21/285 (2006.01); C23C 16/08 (2006.01); C23C 16/455 (2006.01); C23C 16/06 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28562 (2013.01); C23C 16/06 (2013.01); C23C 16/08 (2013.01); C23C 16/45527 (2013.01); C23C 16/45553 (2013.01); H01L 21/28556 (2013.01); H01L 29/7869 (2013.01);
Abstract
Processing methods comprising exposing a substrate to an optional nucleation promoter followed by sequential exposure of a first reactive gas comprising a metal oxyhalide compound and a second reactive gas to form a metal film on the substrate.
Published as: