David Knapp

Title: The Innovative Contributions of David Knapp

Introduction

David Knapp is a prominent inventor based in Santa Clara, California. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 16 patents. His work focuses on enhancing etching processes and oxide layer formation, which are critical in the production of advanced semiconductor devices.

Latest Patents

One of David Knapp's latest patents is titled "Enhanced etch selectivity using halides." This method involves performing a dry etch process to remove a portion of a first layer on a second layer of a stack of alternating materials. The process creates a passivation layer that enhances the etching selectivity by introducing a halide gas. Another notable patent is the "Dual pressure oxidation method for forming an oxide layer in a feature." This method describes a technique for growing an oxide layer within a substrate feature by utilizing both high-pressure oxidant exposure and lower-pressure oxygen-containing plasma exposure. This innovative approach is particularly suitable for high-aspect ratio trenches or holes in semiconductor manufacturing.

Career Highlights

David Knapp is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to develop and refine techniques that are essential for modern semiconductor fabrication. His expertise in etching and oxidation processes has positioned him as a key contributor to advancements in the field.

Collaborations

Throughout his career, David has collaborated with several talented individuals, including David P. Thompson and Jeffrey W. Anthis. These collaborations have fostered an environment of innovation and have led to the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

David Knapp's contributions to the field of semiconductor manufacturing through his patents and collaborative efforts have significantly advanced the industry. His innovative methods continue to influence the development of more efficient and effective semiconductor devices.