The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Feb. 01, 2024
Applied Materials, Inc., Santa Clara, CA (US);
David Knapp, Santa Clara, CA (US);
Feng Qiao, San Jose, CA (US);
Hailong Zhou, San Jose, CA (US);
Junkai He, San Jose, CA (US);
Qian Fu, Pleasanton, CA (US);
Mark J. Saly, Santa Clara, CA (US);
Jeffrey Anthis, Redwood City, CA (US);
Jayoung Choi, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method includes performing a dry etch process to remove a portion of a first layer disposed on a second layer of a stack of alternating layers. The first layer includes a first material and the second layer includes a second material different from the first material, and the dry etch process forms a passivation layer including a byproduct on surfaces of the second material. A amount of first material of the portion of the first layer remains after performing the dry etch process, The method further includes introducing a halide gas to enhance the passivation layer on the surfaces of the second material.