The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Oct. 21, 2013
Applied Materials, Inc., Santa Clara, CA (US);
David Thompson, San Jose, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Xinliang Lu, Fremont, CA (US);
Wei Tang, Santa Clara, CA (US);
Jing Zhou, Milpitas, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
Jeffrey W. Anthis, San Jose, CA (US);
Atif Noori, Saratoga, CA (US);
Faruk Gungor, San Jose, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Mei Chang, Saratoga, CA (US);
Shih Chung Chen, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Films comprising Aluminum, carbon and a metal, wherein the aluminum is present in an amount greater than about 16% by elemental content and the film has less than about 50% carbon. Methods of forming the films comprise exposing a substrate to a metal halide precursor, purging the metal halide precursor from the processing chamber and then exposing the substrate to an alkyl aluminum precursor and an alane precursor, either sequentially or simultaneously. The alane precrursor comprises an amine-alane and a stabilizing amine selected from one or more of diemthylcyclohexylamine or dicyclomethylhexylamine.