The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Jun. 28, 2013
Applied Materials, Inc., Santa Clara, CA (US);
Srinivas Gandikota, Santa Clara, CA (US);
Xinliang Lu, Fremont, CA (US);
Shih Chung Chen, Cupertino, CA (US);
Wei Tang, Santa Clara, CA (US);
Jing Zhou, Milpitas, CA (US);
Seshadri Ganguli, Sunnyvale, CA (US);
David Thompson, San Jose, CA (US);
Jeffrey W. Anthis, San Jose, CA (US);
Atif Noori, Saratoga, CA (US);
Faruk Gungor, San Jose, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Mei Chang, Saratoga, CA (US);
Xinyu Fu, Fremont, CA (US);
Yu Lei, Foster City, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Provided are methods of depositing films comprising alloys of aluminum, which may be suitable as N-metal films. Certain methods comprise exposing a substrate surface to a metal halide precursor comprising a metal halide selected from TiCl, TaCland HfClto provide a metal halide at the substrate surface; purging metal halide; exposing the substrate surface to an alkyl aluminum precursor comprising one or more of dimethyaluminum hydride, diethylhydridoaluminum, methyldihydroaluminum, and an alkyl aluminum hydrides of the formula [(CxHy)AlH], wherein x has a value of 1 to 3, y has a value of 2x+2, a has a value of 1 to 2, and n has a value of 1 to 4; and exposing the substrate surface to an alane-containing precursor comprising one or more of dimethylethylamine alane, methylpyrrolidinealane, di(methylpyrolidine)alane, and trimethyl amine alane borane. Other methods comprise exposing a substrate surface to a metal precursor and trimethyl amine alane borane.