Anton Koriakin

Title: Anton Koriakin: A Pioneer in Substrate Processing Technologies

Introduction

Anton Koriakin, an innovative inventor based in Cheonan-si, South Korea, has made significant contributions to the field of substrate processing. With an impressive portfolio of 11 patents, his inventions are at the forefront of technological advancements in the semiconductor industry.

Latest Patents

Among Koriakin's latest patents are groundbreaking developments in substrate processing methods and systems. One notable patent details a substrate processing method that utilizes a rinse process involving a rinse solution applied to a development-processed photoresist pattern on a substrate. This method also incorporates a substitution process consisting of a first substitution step utilizing a mixed solution of a non-polar organic solvent and a surfactant, followed by a second substitution step with the non-polar organic solvent. This process is executed multiple times until the remaining rinse solution on the substrate is reduced to a predetermined value. Additionally, a supercritical fluid drying process is employed to effectively remove any residual non-polar organic solvent from the substrate. Another key patent involves a substrate treating apparatus and method, which consists of a first process chamber for the application of organic solvent and a second process chamber for treatment using supercritical fluid technology.

Career Highlights

Throughout his career, Anton Koriakin has held positions at various distinguished organizations, including Semes Co., Ltd. and Sungkyunkwan University. His work has not only contributed to his personal achievements but has also played a crucial role in advancing the capabilities of substrate processing technology in the industry.

Collaborations

Koriakin has worked alongside talented individuals such as Hae-Won Choi and Kihoon Choi. These collaborations have further enriched his research and development efforts, allowing for more innovative solutions in substrate processing.

Conclusion

With 11 patents under his name, Anton Koriakin stands out as a leading figure in semiconductor substrate processing innovation. His work continues to inspire advancements in the field, making significant strides towards improving the efficiency and effectiveness of substrate treatment methodologies.