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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11004675 B1

PDFFull Text
Date of Patent:
May. 11, 2021

Filed:

Sep. 12, 2018

Substrate cleaning composition, substrate treating method, and substrate treating apparatus

Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Hae-Won Choi, Daejeon, KR;

Ki-Moon Kang, Yongin-si, KR;

Kihoon Choi, Cheonan-si, KR;

Anton Koriakin, Cheonan-si, KR;

Chan Young Heo, Hwaseong-si, KR;

Jaeseong Lee, Hwaseong-si, KR;

Kwon Taek Lim, Busan, KR;

Yong Hun Kim, Busan, KR;

Sang Ho Lee, Busan, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
C11D 7/36 (2006.01); H01L 21/02 (2006.01); B08B 3/08 (2006.01); C09K 13/08 (2006.01); H01L 21/67 (2006.01); C11D 7/34 (2006.01); C11D 11/00 (2006.01); H01L 21/687 (2006.01); C11D 7/50 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 3/08 (2013.01); C09K 13/08 (2013.01); C11D 7/34 (2013.01); C11D 7/36 (2013.01); C11D 7/5022 (2013.01); C11D 11/0047 (2013.01); H01L 21/6719 (2013.01); H01L 21/67028 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01);
Abstract

Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.

Find Patent Forward Citations

Choi, Hae-Won. (2021). Substrate cleaning composition, substrate treating method, and substrate treating apparatus (U.S. Patent No. 11004675). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11004675

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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