The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 2024

Filed:

Apr. 21, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Ki Hoon Choi, Cheonan-si, KR;

Eung Su Kim, Cheonan-si, KR;

Pil Kyun Heo, Hwaseong-si, KR;

Jin Yeong Sung, Chungcheongbuk-do, KR;

Hae-Won Choi, Daejeon, KR;

Anton Koriakin, Cheonan-si, KR;

Joon Ho Won, Suwon-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 (2006.01); F26B 5/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/30 (2013.01); F26B 5/005 (2013.01);
Abstract

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space therein; a supply line having a first open/close valve installed thereon and configured to supply a treating fluid to the treating space; a heater installed on the supply line and configured to heat the treating fluid; an exhaust line having a second open/close valve installed thereon and configured to exhaust the treating space; and, a controller configured to control the first open/close value and the second open/close valve such that the treating fluid heated is supplied to and exhausted from the treating space before a treating process is performed on a substrate in the treating space.


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