The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2020
Filed:
Sep. 29, 2017
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Ki-Moon Kang, Chungcheongnam-do, KR;
Anton Koriakin, Chungcheongnam-do, KR;
In Il Jung, Chungcheongnam-do, KR;
Hae-Won Choi, Daejeon, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); B08B 7/00 (2006.01); H01L 21/67 (2006.01); C11D 11/00 (2006.01); H01L 21/311 (2006.01); C07C 31/02 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0021 (2013.01); C11D 7/5022 (2013.01); C11D 11/0047 (2013.01); H01L 21/31133 (2013.01); H01L 21/6708 (2013.01); H01L 21/6719 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01); C07C 31/02 (2013.01);
Abstract
Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The substrate cleaning composite includes an etching compound that provides a component for treating a substrate, and a solvent that dissolves the etching compound, wherein the substrate cleaning composite is an anhydrous composite that does not include water.