The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 07, 2024

Filed:

Sep. 11, 2020
Applicants:

Semes Co., Ltd., Cheonan-si, KR;

Research & Business Foundation Sungkyunkwan University, Gyeonggi-do, KR;

Inventors:

Hae-Won Choi, Daejeon, KR;

Yerim Yeon, Hwaseong-si, KR;

Anton Koriakin, Cheonan-si, KR;

Kihoon Choi, Cheonan-si, KR;

Youngran Ko, Daegu, KR;

Jeong Ho Cho, Seoul, KR;

Hyungseok Kang, Suwon-si, KR;

Hong Gi Min, Seoul, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); G03F 7/168 (2013.01); H01L 21/67225 (2013.01); G03F 7/039 (2013.01); G03F 7/322 (2013.01);
Abstract

A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.


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