Daegu, South Korea

Youngran Ko

This inventor holds 2 USPTO granted patents. Top assignees: Semes Co., Ltd., Sungkyunkwan University. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youngran Ko. Retrieved from https://idiyas.com/inventor/youngran-ko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Youngran Ko: Innovator in Substrate Processing Technologies

Introduction

Youngran Ko is a notable inventor based in Daegu, South Korea. He has made significant contributions to the field of substrate processing, holding 2 patents that showcase his innovative approach to technology.

Latest Patents

His latest patents include a "Substrate Treating Apparatus and Substrate Treating Method." This invention provides a substrate treating apparatus that consists of a first process chamber for applying an organic solvent to a substrate and a second process chamber for treating the substrate using a supercritical fluid. Another important patent is the "Method and Apparatus for Parts Cleaning," which outlines a method for cleaning parts used in substrate processing by supplying plasma generated from cleaning gas along with a cooling medium.

Career Highlights

Throughout his career, Youngran Ko has worked with reputable organizations such as Semes Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to develop and refine his innovative ideas in substrate processing.

Collaborations

He has collaborated with notable colleagues, including Soon-cheon Cho and Su Hyung Lee, contributing to advancements in their respective fields.

Conclusion

Youngran Ko's work in substrate processing technologies highlights his role as a key innovator in the industry. His patents reflect his commitment to improving substrate treatment methods and cleaning processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…