The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Feb. 16, 2021
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Soon-Cheon Cho, Pyeongtaek-si, KR;
Su Hyung Lee, Hwaseong-si, KR;
Youngran Ko, Daegu, KR;
Juyong Jang, Yongin-si, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 7/00 (2006.01); B08B 13/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); B08B 7/0035 (2013.01); B08B 13/00 (2013.01); H01J 37/3244 (2013.01); H01L 21/67034 (2013.01); H01J 37/32192 (2013.01); H01J 37/32825 (2013.01); H01J 2237/002 (2013.01); H01J 2237/335 (2013.01);
Abstract
The present invention provides a method and apparatus for cleaning parts used in substrate processing. In a method for cleaning parts of a substrate processing, plasma generated from cleaning gas is supplied together with a cooling medium to clean the parts, but the cooling medium may be provided at a lower temperature than the plasma.