Location History:
- Cheonan-si, KR (2019)
- Yongin-si, KR (2024)
Company Filing History:
Years Active: 2019-2024
Title: Juyong Jang: Innovator in Substrate Processing Technologies
Introduction
Juyong Jang is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing, particularly through his innovative methods and apparatuses for cleaning parts used in this industry. With a total of 2 patents to his name, Jang continues to push the boundaries of technology.
Latest Patents
Jang's latest patents include a "Method and apparatus for parts cleaning" and a "Nozzle unit and coating apparatus including the same." The first patent provides a method for cleaning parts used in substrate processing by supplying plasma generated from cleaning gas along with a cooling medium. This innovative approach allows for effective cleaning while maintaining optimal temperatures. The second patent describes a coating apparatus that includes a support unit for holding a coating object and a spray assembly for applying a fluid containing a coating material. This apparatus features a nozzle unit designed to generate plasma from the fluid, enhancing the coating process.
Career Highlights
Juyong Jang is currently employed at Semes Co., Ltd., where he applies his expertise in substrate processing technologies. His work has been instrumental in developing advanced cleaning and coating methods that improve efficiency and effectiveness in the industry.
Collaborations
Jang collaborates with talented coworkers, including Soon-cheon Cho and Su Hyung Lee. Their combined efforts contribute to the innovative projects at Semes Co., Ltd., fostering a collaborative environment that encourages technological advancements.
Conclusion
Juyong Jang is a prominent inventor whose work in substrate processing has led to significant innovations. His patents reflect a commitment to improving industry standards through advanced cleaning and coating technologies. Jang's contributions continue to shape the future of substrate processing.