The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 09, 2022

Filed:

Apr. 28, 2019
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Jaeseong Lee, Hwaseong-si, KR;

Kihoon Choi, Cheonan-si, KR;

Hae-Won Choi, Daejeon, KR;

Anton Koriakin, Cheonan-si, KR;

Chan Young Heo, Hwaseong-si, KR;

Do Heon Kim, Cheonan-si, KR;

Ji Soo Jeong, Seoul, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67103 (2013.01); H01L 21/02057 (2013.01); H01L 21/02101 (2013.01); H01L 21/67034 (2013.01); H01L 21/67126 (2013.01);
Abstract

An apparatus for processing a substrate includes a chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, and a temperature adjustment unit that is installed in the chamber and that adjusts temperature in the processing space. The temperature adjustment unit includes a heating member that heats the processing space and a cooling member that cools the processing space. The cooling member is located closer to a central axis of the chamber than the heating member.


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